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thermal evaporationsputteringglow dischargenos-antifogmedium frequencyPECDVcryogenic trap in chamber
THERMAL
EVAPORATION
SPUTTERING GLOW
DISCHARGE
NOS-ANTIFOG MEDIUM
FREQUENCY
PECVD CRYOGENIC
TRAP
 

CRYOGENIC TRAP IN CHAMBER

Just ARZUFFI’s equipments are provided with this technology. What makes unique this technical solution is that the cryogenic trap (linked to Polycold unit) is installed
directly inside the process chamber.

The advantages of the innovation are listed below:
- complete cycle time reduction.
The cryogenic trap installed inside the chamber makes the pumping quicker both in pre-vacuum and in high vacuum phase, reducing the time of the complete process.
- cycle time constancy.
The cryogenic trap installed inside the chamber allows to have constant cycle times, avoiding changes that would cause confusion and in-line production stops.

This technical innovation is strongly suggested in the presence of the following cases:
- high humidity and temperature levels inside the production area (for example in the Asian countries)
- material of the substrate very sensitive to humidity contamination (for example PA66)
- long time storage (many hours/days) between injection and metallization phase.



 ARZUFFI SRL - Via Belvedere, 26 - 20862 Arcore (MB) - Tel. +39 039 6012626 - Fax +39 039 6201973 - PIVA 02823530965 - info@arzuffisrl.it                                    credits: Brescianet
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