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thermal evaporationsputteringglow dischargenos-antifogmedium frequencyPECDVcryogenic trap in chamber
THERMAL
EVAPORATION
SPUTTERING GLOW
DISCHARGE
NOS-ANTIFOG MEDIUM
FREQUENCY
PECVD CRYOGENIC
TRAP
 

PLASMA – MEDIUM FREQUENCY (MF)

Glow discharge, polymerization, NOS and antifog phases require the creation of a plasma (activated gas) in the process chamber.
The gas (plasma) is activated through an electric field generated by a power supply, usually in alternating current (DC).
Instead ARZUFFI’s equipments are provided with a plasma activation system in Medium Frequency (MF) in order to reach a better quality of the process and reduce treatments time.
medio frequenza
This technical device has the following advantages:

- Faster complete cycle time: 50% reduction of treatment time in the phases where MF is applied;
- Better quality of substrates: it’s possible to reach the desired quality level also in the presence of complicated structures and deep cavities;
- Cut in raw material costs: it’s not necessary to coil aluminium foils round the glow discharge cathode;
- Loading time reduction: it’s not necessary to replace the glow discharge cathode after every cycle because with the MF technology the cathodes must be replaced, in order to be cleaned, just once a day.

On the ARZUFFI’s equipments provided with MF technology are installed on the two sides of the fix half-shell two cathodes, that generally consists in two metallic plates that are designed depending on process chamber size.





 ARZUFFI SRL - Via Belvedere, 26 - 20862 Arcore (MB) - Tel. +39 039 6012626 - Fax +39 039 6201973 - PIVA 02823530965 - info@arzuffisrl.it                                    credits: Brescianet
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