PVD – THERMAL EVAPORATION

It’s still the most widespread system in the metallization field due to its easy use and the effectiveness of deposition in the presence of substrates with complicated
shapes and structures.

The deposition source consists in tungsten filaments, which are usually put in the central part of the process chamber, over them is put the piece of
metal that you want to deposit.

The substrates are located around the filaments and they are made to rotate (rotation and translation) during metal deposition phase.

In order to obtain the metal deposition inside the process chamber it’s necessary to reach a vacuum value generally not superior than 4x10-4 mbar (high vacuum).
When it’s reached the necessary vacuum value starts the evaporation phase that consists in tungsten filaments heating: when they get incandescent, they fuse the metal that evaporates and condenses on the substrates surface.

ARZUFFI’s equipments are provided with a high quality evaporation phase thanks to a control system called “Feedback” because exerts a retroactive control of the process (Profibus link with data transfer in milliseconds) in order to have a gradual and constant improve of the power on the filaments, both in preheating and heating phase, in this way it’s possible to avoid sudden changes in power that would cause deposition defects (sprinkles, drops, etc.).

Example of evaporation controlled by “feedback”

  Pre-heating                                 Heating                                      Evaporation

The flexibility and simplicity of this technology allows to coat substrates made with different materials and with complicated structures, shapes and dimensions.