Plasma PVD

PECVD systems for any surface coating

PECVD (Plasma-Enhanced Chemical Vapor Deposition) is a chemical deposition process that takes place under vacuum and enables the formation of nanometric films through the condensation of a gaseous precursor onto the substrate. The purpose of plasma-based treatments is to enhance the performance of material surfaces.

The plasma systems we design, manufacture, and install make it possible to modify the surface tension of various types of substrates by introducing specific gases such as Oxygen, Argon, and Nitrogen into the chamber and activating them with glow discharge through pulsed DC, medium frequency (MF), or radio frequency (RF) generators. The resulting surfaces are chemically different from the original ones, while maintaining the same mechanical and physical properties.

The most requested treatments include deep surface cleaning, metal degreasing, activation and pretreatment of plastic surfaces, improved wettability, enhancement of hydrophilic and/or hydrophobic qualities, material sterilization, anti-adhesion, and anti-fog treatment.

With over 30 years of consolidated know-how, we are able to provide continuous innovations in PECVD systems that produce invisible, extremely high-quality films.

Arzuffi plasma coating systems are often used and integrated into existing painting lines to increase and ensure stronger paint adhesion to the substrate.

Staying true to our commitment to develop only green technologies, our plasma systems use sustainable, eco-friendly, and clean technology, as they do not employ toxic chemicals or solvents and feature very low energy consumption.

Contact us for more information about our plasma high-vacuum systems. We operate in Italy and worldwide.

The plants

Plasma-Met

Batch Manual Solution

Plasma-Met is a system for managing the plasma process, also known by the acronym PECVD (Plasma-Enhanced Chemical Vapor Deposition). The system is fully automated and designed to be integrated into an industrial painting production line, thanks to its very short cycle time of less than 60 seconds.

Plasma-Cube

Plasma-Cube-fronte

Batch Manual Solution

Plasma-Cube is Arzuffi’s PECVD (Plasma-Enhanced Chemical Vapor Deposition) system. The parts are placed in a low-pressure vacuum chamber, where gases are ionized by an electromagnetic field to obtain high-density films with a semi-crystalline structure, characterized by the absence of porosity and varying levels of hardness. These nanometric films can be extremely elastic and are capable of modifying the surface of plastics and elastomers while preserving their geometry.

Sputtering
Sputtering
Deposition of thin metallic layers through magnetron cathodes and accelerated ions, ideal for uniform and high-performance coatings.
Tecnologia Combinata
Combined Technology
Hybrid sputtering and thermal evaporation in a single system—offering maximum flexibility for selecting materials and processes.
Evaporazione Termica
EThermal evaporation
Consolidated technology that uses high-intensity current to sublimate the material and deposit it precisely, even on distant surfaces.
Plasma PECVD
Plasma PECVD
Plasma technique for advanced surface treatments: cleaning, activation, degreasing, and coatings with functional properties.
Impianti di laboratorio
Laboratory systems
Compact solutions for high-tech coatings: Arzuffi’s Test-Met, ideal for R&D, quality control, and high-vacuum sampling.

Contact us